Design and fabrication of advanced EUV diffractive elements

Patrick P. Naulleau, James A. Liddle, Farhad Salmassi, Erik H. Anderson, Eric M. Gullikson, Eric G. Johnson, Gregory P. Nordin
2004 Micromachining Technology for Micro-Optics and Nano-Optics II  
As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive
more » ... diffractive structures. Here we describe recent advancements made in the fabrication of such devices.
doi:10.1117/12.537195 fatcat:xu4p34oyh5cotjaz7pivefmxha