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Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
2021
Coatings
Zirconium oxides were deposited using plasma-enhanced atomic layer deposition (PEALD) involving (2-(N-methylamino)1-MethylEthyleneCyclopentadienyl)Bis(DiMethylAmino)Zr (abbreviated as CMEN-Zr) and oxygen plasma as zirconium and oxygen sources. The zirconium oxide thin films demonstrate temperature-independent growth rates per cycle of 0.94 A/cycle at 150–215 °C. The deposited ZrO2 thin films were characterized using numerous analytical tools, i.e., X-ray photoelectron spectroscopy for chemical
doi:10.3390/coatings11030362
fatcat:7fvkt2z5zjaxzngnwmg3io7bq4