A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2018; you can also visit the original URL.
The file type is
Moving-mask Lithography for 3D Microstructure Molding
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could bedoi:10.2494/photopolymer.27.85 fatcat:fkdml6os45dntlkhede2rghbq4