Moving-mask Lithography for 3D Microstructure Molding

Nobuhiro Kato, Takahisa Kai, Masakazu Hirano
2014 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could be
more » ... lly predicted using the proposed simulation method.
doi:10.2494/photopolymer.27.85 fatcat:fkdml6os45dntlkhede2rghbq4