Complex plume stoichiometry during pulsed laser deposition of SrVO3 at low oxygen pressures

Jun Wang, Guus Rijnders, Gertjan Koster
2018 Applied Physics Letters  
To control the pulsed laser deposition synthesis, knowledge on the relation between the plasma plume and the grown thin film is required. We show that the oxidation of species in the plasma plume still affects the SrV O 3 growth at low oxygen partial pressures. Optical emission spectroscopy measurement for the plasma plume at different growth conditions were correlated to the film properties determined by Atomic force microscopy, X-ray diffraction and transport. At reducing oxygen pressures,
more » ... xygen pressures, the background argon pressure can affect the oxidation in the plasma plume, which in
doi:10.1063/1.5049792 fatcat:fv6ixl5kqrfmboc57ql4boyh2q