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Enhanced room-temperature luminescence efficiency through carrier localization in AlxGa1−xN alloys
2005
Applied Physics Letters
AlGaN samples grown by plasma-assisted molecular-beam epitaxy on sapphire ͑0001͒ substrates, with 20%-50% Al content and without the use of indium, show intense room-temperature photoluminescence that is significantly redshifted, 200-400 meV, from band edge. This intense emission is characterized by a long room-temperature lifetime ͑ϳ375 ps͒ comparable to that seen in low defect density ͑ϳ10 8 cm −2 ͒ GaN. Room-temperature monochromatic cathodoluminescence images at the redshifted peak reveal
doi:10.1063/1.1856702
fatcat:5q4bduedjjajrpf2k7qtts7wza