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Photoacid generation in polymeric films
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
A major photoproduct from the irradiation of triphenylsulfonium salts is a Bronsted acid. This photochemical process has been used in several polymer film applications where the acid is used for crosslinking of films or to initiate some other acid catalyzed reaction. Despite the widespread applications of these materials, little has been published about the efficiency of acid generation in polymeric films or catalytic chain length associated with chemically amplified systems. This talk willdoi:10.2494/photopolymer.3.375 fatcat:iqrnlckbvfgiri557z7dwy34sm