Grown-in defects in silicon crystals responsible for gate oxide integrity deterioration
シリコン結晶中の成長時導入欠陥と酸化膜耐圧劣化

Tomohiro MERA, Jaroslaw Jablonski, Kiyoshi NAGAI, Masaharu WATANABE
1997 Oyobuturi  
doi:10.11470/oubutsu1932.66.728 fatcat:h65kgt7ttrdatp6nojvngk3goe