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Potential of discharge-based lithium plasma as an extreme ultraviolet source
2006
Applied Physics Letters
Preserved Fulltext
Extreme ultraviolet ͑EUV͒ discharge-based lamps for EUV lithography need to generate extremely high power in the spectrum band of 13.5± 0.135 nm. A model was developed to investigate the wavelength-integrated Lyman-␣ lines light outputs in hydrogen-like lithium ion. The analysis reveals that the commonly observed low conversion efficiency is largely due to a transient nature of Z discharge-based plasma and that a magnetically confined lithium plasma is an efficient EUV source even at low
doi:10.1063/1.2227560
fatcat:oxmog5txprcsblhvet2ogv5kdi