Low‐temperature chemical vapor deposition of tungsten from tungsten hexacarbonyl

Gerald J. Vogt
1982 Journal of Vacuum Science and Technology  
Chemical vapor deposition (CVD) of tungsten from W(CO)6 Pas been investigated below 670 K as an alternate process to~F6 CVD for coating glass microsphere. The major advantages of W(CO)6 CVD are the elimination of the HF damage to the glass microsphere and potentially a lower deposition temperature for coating DT-filled microsphere. '(CO)6 CVD can be utilized, in principle, to coat the microsphere with 1 to 5 pm of tungsten or to flash coat the microsphere for further coating by WF6 CVD. Test
more » ... by WF6 CVD. Test coatings were deposited ill a fluidized-bed reactor with a hydrogen carrier gas. lhe coatings were found to contain nearly-equal portions of carbon and oxygen, ranging fram 16 to 25 at.% for each element. The high carbon and oxygen concentrations are believed to result principally from the physical entrapment of chemisorbed CO molecules at the surface of the growing ch=posit. The general quality and adhesion of the W(CO)6-derived coating% are~nsatisfactory at this time for ICF applications. The poor coating quality may possibly be due to an undesirable design feature in the fluic!ized-bml reacto-.
doi:10.1116/1.571599 fatcat:pzgtdbylfnczhok5eamdqxqh7e