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Optical Microlithography XX
Optical lithography has been the dominant patterning process for semiconductor fabrication for over 40 years. The patterning process evolved initially from methods used in the printing industry, but as integrated circuits became more complex, and as device geometries shrank, sophisticated new imaging methods evolved. Today's optical lithography systems represent the highest resolution, most accurate optical imaging systems ever produced. This remarkable evolutionary process continues to thisdoi:10.1117/12.720631 fatcat:zkajgihsandh3c3hgfapgeup5q