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Design for e-beam: design insights for direct-write maskless lithography
2010
Photomask Technology 2010
Designers always want maximum freedom in design, but they understand that chips have to yield and at a reasonable cost. The strong ecosystem support of restricted design rules to make 193i workable for sub-30nm nodes is evidence of this. In direct write e-beam, there are design insights that lead to a tangible improvement in throughout while minimizing the restrictions on the designer. It turns out that a smaller number of primitive cells in a standard cell methodology can enable data
doi:10.1117/12.868483
fatcat:dqj5tzhm2bhnrb2mzvjf3ou6dq