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Model-based scanner tuning in a manufacturing environment
2009
Optical Microlithography XXII
Given the decrease in k1 factor for 65nm-node lithography technology and beyond, it is increasingly important to understand and control the variables which impact scanner imaging behavior in the lithography process. In this work, we explore using model simulations to characterize and predict imaging effects of these variables, and then based on such information to fine-tune the scanner settings to obtain printing results optimally matched to a reference scanner. The scanner modeling makes use
doi:10.1117/12.813974
fatcat:ua6cchixyveijenqfrcdynkrae