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X-ray zone plate fabrication using a focused ion beam
Advances in X-Ray Optics
ABSTIMCT An x-ray zone plate was fabricated using the novel approach of focused ion beam (FIB) milling. The FIB technique was developed in recent years, it has been successfully used for transmission electron microscopy (TEM) sample preparation, lithographic mask repair, and failure analysis of semiconductor devices. During FIB milling, material is removed by the physical sputtering action of ion bombardment. The sputter yield is high enough to remove a substantial amount of material, thereforedoi:10.1117/12.411652 fatcat:qe4iv6usmff6hcydxvnhxyefsm