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Investigation of Preparation Conditions and Microstructure of Mn-N Films by Reactive Sputtering
2008
e-Journal of Surface Science and Nanotechnology
The crystal structure of manganese nitride material depends on the chemical composition. In this paper, we report the crystal structure of manganese nitride which depends on the deposition condition of a flow ratio of argon and nitrogen, FN{= N2/(Ar + N2)}. The samples were fabricated by an RF-sputtering method. Argon and nitrogen were used as a reactive sputtering gas. The crystal structure of the obtained films was analyzed by X-ray diffraction (XRD) measurements. The stoichiometry of the
doi:10.1380/ejssnt.2008.115
fatcat:qm6mrzgxrnepldtkrow3umay4i