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Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser
2000
Japanese Journal of Applied Physics
Phase-shifting masks (PSMs) have provided us a breakthrough in the future semiconductor industry by extending lithography further to the submicrometer order. PSMs have been used over the past several years, and their requirements have changed due to the development of semiconductor technology. We investigated high-transmittance attenuated PSMs (HT-Att-PSMs) that satisfy the requirements of 20 ± 5% transmittance and 180 • phase shift at the exposure wavelength and less than 40% transmittance at
doi:10.1143/jjap.39.6321
fatcat:k4cacuruc5fcxdmehpg2zykmdq