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A Dual Four-Quadrant Photodetector Based on Near-Infrared Enhanced Nanometer Black Silicon
2021
Nanoscale Research Letters
In this paper, a new preparation process of nanometer black silicon is proposed, by which high trapping optical Se-doped black silicon material is prepared by nanosecond pulsed laser ablation of high-resistance silicon coated with Se film in HF gas atmosphere. The results indicate that the average absorptivity of 400-2200 nm band before annealing is 96.81%, and the absorptivity maintains at 81.28% after annealing at 600 degrees. Meanwhile, black silicon prepared under the new technology is used
doi:10.1186/s11671-021-03499-x
pmid:33638762
fatcat:vq667iansna7bcunw4lxwwgzc4