We report the structural and gas sensing properties of tungsten trioxide (WO 3 ) thin films prepared by the KrF excimer pulsed laser deposition technique. The WO 3 thin films having amorphous, crystallized tetragonal and triclinic structures were fabricated at the oxygen pressure of 10-300 mTorr and the substrate temperature of 150-800 C. We revealed the effect of the oxygen pressure and substrate temperature during the deposition on the crystal phases of the WO 3 thin films. The atomic force

more »

... croscopy measurement shows that the average grain size and the average number of grains are approximately 200 nm and 8/ m 2 , respectively. The triclinic WO 3 thin film with a thickness of 1 m showed high sensitivity of 254 in NO (60 ppm) gas at a low operating temperature of 150 C.