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Control design for a 6 DOF e-beam lithography stage
2001
Proceedings of the 2001 American Control Conference. (Cat. No.01CH37148)
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A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using linear feedback, acceleration feedforward, gravity compensation, repetitive control, and error prediction.
doi:10.1109/acc.2001.946086
fatcat:npxst6tsundwpcrzguoxujudiy