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Permanent-Magnet Helicon Discharge Array
2011
IEEE Transactions on Plasma Science
Industrial applications of plasmas often require uniform coverage of large areas, such as in plasma coatings, display panels, and semiconductor wafers. A single source would have to be very large, but an array of small sources can be much more compact and yet cover an arbitrarily large area. Such sources can be inductively coupled plasmas (ICPs) which are powered by radio-frequency generators. Helicon-wave sources have been found to create higher plasma densities than ICPs at the same power,
doi:10.1109/tps.2011.2160345
fatcat:zdqfcibmx5go7i77obsc3pvc5m