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An Oxygen Sensitive ZnO-SiO2-Au Device under uv Irradiation
1990
Electrochemistry
The photon−stimulated (lesorp七ion of gases a七 七he oxide surface has experimen七ally c。nfirmedbys。mew。rkers1−3).In七he pho七〇n−stimulated desorp七ion process, the desorp七iQn rate which is usually extremely low a七roo皿 temperature, is accelera七ed by injecting holes generated by photon excita七ion intQ chemisorp七ion sta七es. In or(1er to apPly the pho七〇n−stimulated desorp七ion to solid−s七ate gas sensQrs7 we designedaZnO−SiO2−Audeviceasaph・t・n− assisted。xygensens。r4).Inacc。rdancewith the theoretical
doi:10.5796/kogyobutsurikagaku.58.1220
fatcat:g3csflrt4fgw5dbjzehi3wodsy