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In this work, Nanostructured TiO 2 thin films were grown by pulsed laser deposition (PLD) technique on glass substrates at 300 °C. TiO 2 thin films were then annealed at 400-600 °C in air for a period of 2 hours. Effect of annealing on the structure, morphology and optical properties were studied. The X-ray diffraction (XRD) and Atomic Force Microscopy (AFM) measurements confirmed that the films grown by this technique have good crystalline tetragonal mixed anatase and rutile phase structurefatcat:ir4wjb5u7regrlr55ckahwdvge