Micromechanical resonant magnetic sensor in standard CMOS

B. Eyre, K.S.J. Pister
Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97)  
A novel magnetic field sensor has been fabricated using xenon difluoride etching of standard CMOS . The field is detected by measuring the vibration amplitude of a mechanical Lorentz force oscillator. The oscillator consists of a current loop on a silicon dioxide plate. Amplitude is detected with a polysilicon piezoresistor Wheatstone bridge. The devices were made in the Orbit 2 micron N-well process through MOSIS.
doi:10.1109/sensor.1997.613670 fatcat:ifpcislzzvdfpa5gfing6pvtly