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Rapid Annealing of Black ZnO Thin Films Prepared by Pulsed Laser Deposition ZnO thin films were deposited by pulsed laser deposition (fluence 2.2 J/cm2) in vacuum on different substrates kept at room temperature. This temperature allowed for fast film growing, however the as-prepared films had low transparency. To improve this optical property, keeping up at the same time the high electric conductivity of the films, post-annealing procedures in vacuum and in air were carried out. The influencedoi:10.2478/v10047-009-0003-4 fatcat:fuhh4kug7vexliisqw55snlojy