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A proper control of the CVD of boron nitride from the B-N-H-F-Ar system, as very thin films in electronic devices or ceramic composite materials, needs a thorough knowledge of the mechanisms of the process. A detailed kinetic study is presented, which provides evidenced a transition from chemical to mass transfer control, as a function of the deposition temperature, total pressure and total flow rate. On the basis of these results, a pressure temperature diagram is proposed, which defines thedoi:10.1051/jp4:1991214 fatcat:55tnbrjbkzcitdgjspukr7wpza