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Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials
2006
Journal of Nanomaterials
Atomic layer deposition (ALD) is ideal for applying precise and conformal coatings over nanoporous materials. We have recently usedALDto coat two nanoporous solids: anodic aluminum oxide (AAO) and silica aerogels.AAOpossesses hexagonally ordered pores with diametersd∼40nm and pore lengthL∼70microns. TheAAOmembranes were coated byALDto fabricate catalytic membranes that demonstrate remarkable selectivity in the oxidative dehydrogenation of cyclohexane. AdditionalAAOmembranes coated withALDPd
doi:10.1155/jnm/2006/64501
fatcat:zozcqymdmvghrhfz3v2c3uoxki