Charge-up Free Ion Implantation in Insulated Substrate using Negative Ion
絶縁性基板への負イオン注入によるチャージアップの軽減

Shigeki SAKAI, Masayasu TANJYO, Tadashi KAWAI, Koji MATSUDA, Yasuhito GOTOH, Hiroshi OHNISHI, Hiroshi TSUJI, Junzo ISHIKAWA
1993 Shinku  
doi:10.3131/jvsj.36.889 fatcat:sa3ucx6bercojpzis5r2oqgwka