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Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma
IEEE Transactions on Plasma Science
Pulsed capacitively coupled plasmas (CCPs) are attractive for controlling electron energy distributions f (ε) and plasma properties for microelectronic fabrication. A conceptual design of a pulsed CCP is discussed which provides additional control over the magnitude and composition of the reactive fluxes to the wafer. We present computed images of time-resolved f (ε) and electron density during a pulse period. Index Terms-Electron energy distribution, plasma simulation, pulsed plasma.doi:10.1109/tps.2011.2132743 fatcat:yun7ze6bkzbn7gdep7bikora5m