Transmission Electron Microscopy Study of FeHfN Thin Films for Magnetic Properties Optimization and Integration Above Silicon Circuits

R Pantel, S Couderc, P Ancey, C Wyon, B Viala
2005 Microscopy and Microanalysis  
Conclusion: Microscopy study (crystallography and chemical analysis) allows the development of FeHfN thin film with optimum soft magnetic properties for integration in silicon device in particular for inductors above IC.
doi:10.1017/s1431927605501922 fatcat:bitchtoihbf2vhyuybwp5nkjum