A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2019; you can also visit the original URL.
The file type is application/pdf
.
Effect of bias voltage on the properties of hydrogenated amorphous carbon films fabricated on CoCrMo alloy by electron cyclotron resonance plasma enhance chemical vapor deposition (ECR-PECVD)
2011
Physics Procedia
In order to increase the wear resistant of the artificial joints, amorphous hydrogenated carbon (a-C:H) films have been deposited on Co-Cr-Mo alloy substrates at different bias pulsed voltage by electron cyclotron resonance plasma enhance chemical vapor deposition (ECR-PECVD). The structure and properties of a-C:H film including sp 3 content, residual stress, mechanical property, adhesion force and wear resistance are examined. The results show that the sp 3 content and the hardness of the
doi:10.1016/j.phpro.2011.06.069
fatcat:e2a5lu2c7zgq7nm6ax7rhwzw3u