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We present an overview of multiple applications of the versatile electro-deposition technique for magnetic thin film preparation. The technique allows excellent parameter control to produce epitaxial ferromagnetic layers on semiconductor substrates. The technique minimizes interface and bulk defects. The selectivity of electrodeposition can also be used for identification and quantification of defects and for lithography-free preparation of nanostructures.doi:10.1149/1.2753270 fatcat:ijypi3svuzdereinmblmyrp2oa