Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl/sub 2/

C.F. Caristrom, R. van der Heijden, A.A.M. Kok, R.W. van der Heijden, F. Karouta, J.J.G.M. van der Tol, R. Notzel, P.J. van Veldhoven, H.W.M. Salemink
International Conference on Indium Phosphide and Related Materials, 2005.  
To]", R. Notzel P.J. van Veldhoven"' and H.W.M. Saleminka.b7" b We have investigated ICP-etching of deep photonic crystal holes in InP using solely Clz as supplied etching gas. The influence of process parameters on hole geometry is discussed and optical test results are reported.
doi:10.1109/iciprm.2005.1517542 fatcat:6hxfcbazyfcilhgmb7vftz5h6y