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The photoluminescence spectrums (PL) of as-prepared and rapid thermal annealing RTA of nanostructures silicon have been investigated. p-Type porous silicon (psi) fabricated by electrochemical etching method .The (PL) of as-prepared sample, showed top of photoluminescence (PL) peak centered at about 540.9 nm. After the annealing process of nanostructures silicon in temperature 450°c, 600°c and 750°c at annealing time 15 sec, the (PL) peaks shifted,to 743.99nm, 747.49nm and 757.37 nm rspectivelydoi:10.22401/jnus.15.2.12 fatcat:ustvepctmbgy3d5ecfisvhq4pa