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Device Performance Analysis of Graphene Nanoribbon Field-Effect Transistor with Rare-Earth Oxide (La2O3) Based High-k Gate Dielectric
2018
International Journal for Research in Applied Science and Engineering Technology
Graphene nanoribbon field-effect transistors (GNRFETs) are promising devices for beyond-CMOS nano electronics in favor of logic applications because GNR offers high mobility for ballistic transport, high carrier velocity for fast switching, monolayer thin body for optimum electrostatic scaling, and excellent thermal conductivity. In this study, the device performance and limitations of GNRFETs are investigated by reducing the channel length below 10 nm. The double gate GNRFET structure is
doi:10.22214/ijraset.2018.1257
fatcat:t5dvdty7bnc3vo2lxwjbtds3oa