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A linear capacitor structure using fractal geometries is described. This capacitor exploits both lateral and vertical electric fields to increase the capacitance per unit area. Compared to standard parallel-plate capacitors, the parasitic bottomplate capacitance is reduced. Unlike conventional metal-to-metal capacitors, the capacitance density increases with technology scaling. A classic fractal structure is implemented with 0.6-m metal spacing, and a factor of 2.3 increase in the capacitancedoi:10.1109/4.735545 fatcat:yl7o7eocgngy5d65vmk6473h54