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Beam incidence conditions in the formation of two-, three-and four-beam laser interference patterns are presented and studied in this paper. In a laser interference lithography (LIL) process, it is of importance to determine and control beam incidence conditions based on the analysis of laser interference patterns for system calibration as any slight change of incident angles or intensities of beams will introduce significant variations of periods and contrasts of interference patterns. In thisdoi:10.1016/j.ijleo.2015.07.039 fatcat:hwh53nbeibcm3bhignqfssqcdm