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Proceedings of 9th IEEE Conference on Artificial Intelligence for Applications
This paper describes the use of automated discovery from databases for diagnosing the causes of rotsprocessing during semiconductor manufacturing. The database eonlains the historl/ of the semieonduc4or wafers as theTI undergo various processing steps. A gener~ste-and-test approach is to3cen for using such a database for automated diagnosis. Based on prior maaual use of such databases, classes of queries to the database useful for fault isolation are identified. Patterns in the responses todoi:10.1109/caia.1993.366594 fatcat:h5nimpaycraqjlqdiqz6upxbiu