A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2015; you can also visit the original URL.
The file type is application/pdf
.
Fault isolation during semiconductor manufacturing using automated discovery from wafer tracking databases
Proceedings of 9th IEEE Conference on Artificial Intelligence for Applications
This paper describes the use of automated discovery from databases for diagnosing the causes of rotsprocessing during semiconductor manufacturing. The database eonlains the historl/ of the semieonduc4or wafers as theTI undergo various processing steps. A gener~ste-and-test approach is to3cen for using such a database for automated diagnosis. Based on prior maaual use of such databases, classes of queries to the database useful for fault isolation are identified. Patterns in the responses to
doi:10.1109/caia.1993.366594
fatcat:h5nimpaycraqjlqdiqz6upxbiu