A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2019; you can also visit the original URL.
The file type is application/pdf
.
Convolution-variation separation method for efficient modeling of optical lithography
2013
Optics Letters
We propose a general method called convolution-variation separation (CVS) to enable efficient optical imaging calculations without sacrificing accuracy when simulating images for a wide range of process variations. The CVS method is derived from first principles using a series expansion, which consists of a set of predetermined basis functions weighted by a set of predetermined expansion coefficients. The basis functions are independent of the process variations and thus may be computed and
doi:10.1364/ol.38.002168
pmid:23811866
fatcat:5ywfhzbibjg3tme2dnga27ajhm