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Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamond carbon phases, selective etching of diamond facets, and termination of the diamond surfaces by sp 3 -C -H species. Exposure to atomic oxygen, on the other hand, produced significant chemicaldoi:10.1063/1.2939561 fatcat:u6233f22rnacfluo3jto3jvw64