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In scanning beam interference lithography (SBIL), a resist-coated substrate is scanned under phase-locked interfering beams to pattern large gratings or grids with nanometer level distortions. To achieve design goals, it is required to measure the spatial period, phase, and rotation of the interference fringes in real-time with high precision. In this paper, we report the use of a Fresnel zone plate to characterize interference fringes. With properly controlled errors, it should enable us todoi:10.1116/1.1523018 fatcat:mxfbeqt5a5awbp2ps4imft3wdq