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Stainless steel will become the substrate material of the flexible display, requirements of the flexible substrate in the surface quality and performance are very strict. Chemical mechanical polishing (CMP) is one of the most appropriate technologies to achieve the surface processing of ultra-thin stainless-steel flexible display substrate with ultra-smooth and damage-free. In this paper, the design of CMP slurry of 304 stainless steel on the hydrogen peroxide-oxalic acid type was proposed.doi:10.1051/matecconf/202032702002 fatcat:ytsm63h7pngdflpaigdapgb5re