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A new algorithm for determining the extrema in the dependence of the reflection coefficient on the optical thickness of the deposited layer is proposed. This reflection coefficient is measured during the deposition process of a multilayer coating. The proposed algorithm uses a physical model of the deposition process, which makes it possible to use all the measurement data accumulated by a recording device during the deposition of the layer in contrast to the classical approaches thatdoi:10.26089/nummet.v20r441 fatcat:cfdjzybxj5dqjcdlr4vu6xay7u