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The solution-refined method is developed to solve electrostatic fields of the electron-beam direct-write lithography system. The prediction of accurate electron trajectories and the geometry of the developed photoresist patterns rely on high-resolution electrostatic fields in the whole system. Considering fabrication errors, such electrostatic fields cannot be solved using a cylindrical symmetry. Thus, this problem is a multiscale problem that requires a huge computer memory to solve. In ourdoi:10.7567/jjap.52.055202 fatcat:x6zqbemowvghzim5vmx26oajnm