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In-process force monitoring for precision grinding semiconductor silicon wafers
2005
International Journal of Manufacturing Technology and Management (IJMTM)
Forces generated during precision wafer grinding are small and present challenges for accurate and reliable process monitoring. In this work, these challenges are met by incorporating noncontact displacement sensors into an aerostatic spindle that is calibrated to measure grinding forces from the relative motion between the spindle rotor and stator. This arrangement allows the calculation of grinding forces without introducing compliance into the structural loop of the grinding machine.
doi:10.1504/ijmtm.2005.007695
fatcat:32srocxm6fdkpoiahmobr46ddu