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Titanium oxide thin film, fabricated with tetraisopropyltitanate and oxygen by electron cyclotron resonance-plasma-enhanced chemical vapor deposition, is investigated as a potential candidate for the antireflective layer in KrF excimer laser ͑248-nm͒ lithography. The oxygen flow-rate dependence of the optical properties such as the refractive index ͑n͒ and the extinction coefficient ͑k͒ of the film at the 248-nm wavelength has been characterized, and the films with the expected combinations ofdoi:10.1364/ao.36.001482 pmid:18250825 fatcat:ov2ituv2cjgefov5r4yeeudglu