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Real-time optical thermometry during semiconductor processing
1995
IEEE Journal of Selected Topics in Quantum Electronics
The optic,al techniques used to monitor the temperature of wafers during semiconductor processing are surveyed. The physical principles underlying each method are described. Applications of each oiptical diagnostic are presented, along with the strengths and weaknesses of the probe. Most of these optical diagnostics have been implemented in research reactors to monitor wafer temperature during one or several types of thinfilm processing, such as molecular beam epitaxy, rapid thermal processing,
doi:10.1109/2944.488681
fatcat:di7dqnnvjjdvlc2d67yeem24q4