Remote plasma deposition of hydrogenated amorphous silicon : plasma processes, film growth, and material properties [article]

WMM Erwin Kessels, DC Daan Schram, WF Werner Van Der Weg, MCM Richard Van De Sanden
2000
doi:10.6100/ir536418 fatcat:t3mpbotm4jhsva2i6xva7f5sb4