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Development of 250W EUV light source for HVM lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M. Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada (+5 others)
2017 High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI  

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doi:10.1117/12.2261075 fatcat:ve6bhryzujeqrgccvjk23qfb5m
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Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Krzysztof M. Nowak, Yasufumi Kawasuji,, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Tsuyoshi Yamada, Taku Yamazaki, Shinji Okazaki, Takashi Saitou, Stefan Kaierle, Stefan W. Heinemann. "Development of 250W EUV light source for HVM lithography." High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI (2017)