Low-resistivity C54-TiSi2 as a sidewall-confinement nanoscale electrode for three-dimensional vertical resistive memory

José Ramón Durán Retamal, Chen-Fang Kang, Po-Kang Yang, Chuan-Pei Lee, Der-Hsien Lien, Chih-Hsiang Ho, Jr-Hau He
2014 Applied Physics Letters  
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doi:10.1063/1.4901072 fatcat:vh575y6qhfemfe7eko753vlgh4