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Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy
2005
Physical Review B
Thin films of iron and permalloy Ni80Fe20 were prepared using an Ar+N2 mixture with magnetron sputtering technique at ambient temperature. The nitrogen partial pressure, during sputtering process was varied in the range of 0 to 100%, keeping the total gas flow at constant. At lower nitrogen pressures RN2<33% both Fe and NiFe, first form a nanocrystalline structure and an increase in nitrogen partail pressure results in formation of an amorphous structure. At intermediate nitrogen partial
doi:10.1103/physrevb.72.024202
fatcat:bqziggkvqjbh7ad3omk4a3hwgq