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Nanocrystalline silicon quantum dots prepared by VHF plasma enhanced chemical vapor deposition
2001
Journal de Physique IV : Proceedings
Nanocrystalline silicon is a promising material for future ultralarge scale integrated circuits and display devices. Various methods have been demonstrated for the fabrication of nanocrystalline silicon with size less than 10nm. We have prepared nanocrystalline silicon ultrafine particles by very-high-frequency plasma decomposition of silane and hydrogen. Nanoparticles formed in the plasma cell are extracted through a small orifice and deposited onto substrates. The size of the particle is
doi:10.1051/jp4:20013133
fatcat:6c4xp7ab35fnjgdoulqgtx3chi